Growth and mobility characterization of N-polar AlGaN channel high electron mobility transistors

نویسندگان

چکیده

All-AlGaN based high electron mobility transistors (HEMTs) are promising for increasing the power density in both RF and devices, improving overall efficiency. Nitrogen (N) polar GaN/AlGaN HEMTs offer lower contact resistance compared to its metal-polar counterpart. In this work, we report metal organic chemical vapor deposition (MOCVD)-based growth of N-polar AlGaN channel HEMT structures with a varying Al mole fraction AlxGa1−xN (x = 20%, 30%, 59%, 73%). We confirmed high-quality morphology composition grown using atomic force microscopy x-ray diffraction spectra, respectively. measured ∼160 cm2/(V.s) our stack (20% channel) structure found an alloy-scattering dominated transport fraction, further supported by simulations that consider optical phonon-scattering mechanisms. From 20% 59% composition, decreasing trend while 59%–73% channel, simulated experimental showed nearly saturating trend. The were then fabricated into Al0.20Ga0.80N (channel)/Al0.59Ga0.41N (barrier), showing 320 mA/mm drain current 4 μm long-channel device.

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ژورنال

عنوان ژورنال: Applied Physics Letters

سال: 2023

ISSN: ['1520-8842', '0003-6951', '1077-3118']

DOI: https://doi.org/10.1063/5.0140777